Products Semiconductor / Diamond Substrates

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Single Crystal Substrates

Standard
Specifications
Impurities:
Nitrogen concentration: less than 8ppmB & Si : below SIMS resolution
Crystal orientation:
(100) with the off angle of 3°
Polishing:
Regular (Ra<5nm), Fine (Ra<2nm)
Size:
1 x 1 – 15 x 15mm, Thickness: 0.03 – 3mm
Special
Specifications
  1. ① (110), (111) can be fabricated with length less than 3mm. Width can be selected (ex. 3 x 3mm, 6 x 3mm)
  2. ② (100) Off angle: Between 0 and 5 degree toward selected direction
High quality
Substrate

FWHM of X-ray locking curve can be selected. (ex. FWHM<50arcsec, FWHM<30arcsec)

StandardSpecifications


StandardSpecifications


Mosaic Substrates

  • *Joint from 2 to 9 single-crystal substrates that each size is 10 x 10mm.
  • *Orientation is (100).
  • * Size: <30x30mm, Thickness 0.03~3mm
MosaicSubstrates1
MosaicSubstrates2

Epi-layer on Substrates

1. B-doped epitaxial layer

B concentration:
2~10×1016/cm3
Thickness:
0.5~10µm
Mobility:
1500cm2/Vs or more

2. High quality epitaxial layer

N concentration:
<1ppm
Thickness:
10~100µm
Remarks:
Can be done for Mosaic substrates Can be polished when thickness is more than 30 µm

Heavy Bron-Doped Diamond Substrates

Free Standing Substrate

B Concentration

2×1020 – 4×1020/cm3

Resistivity

Less than 20mΩcm

Thickness

0.2mm

Size

Smaller than 7x7mm

Surface

Both face polished (Ra<5nm or Ra<2nm)

Free Standing Substrate


Heavy Bron Doped Epitaxial Substrate

B Concentration

2×1020 – 4×1020/cm3

Thickness of
boron doped layer

0.03 – 0.2 mm

(Polishing one face needs minimum 0.5mm thickness)

Largest size

Single crystal 8x8mm, Mosaic crystal 18x18mm

Substrate

Standard EDP substrate with thickness 0.3-0.5mm

Heavy Bron Doped Epitaxial Substrate

We will offer various substrates for each customer inquiry.

Details of necessary specification will be required for your inquiries.

Model Number Size (mm) Remarks
RH333Pf2 3×3×0.3 Substrate with the off angle of 2°
RH555PP 5×5×0.5 Both faces regular polishing
RH333KPP 3×3×0.3 (111) Orientation, both faces regular polishing
RB552PP 5×5×0.2 Heavy bron doped substrate
RH20205PV 20×20×0.5 Mosaic substrate, one face regular polishing

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technology and products.